Self-assembly of Silicon Nanotubes

نویسندگان

  • Ming Xie
  • Jiesheng Wang
  • Chee Huei Lee
  • Yoke Khin Yap
چکیده

The growth of silicon nanotubes (SiNTs) by a dual-RF-plasma treatment technique is reported here. These SiNTs are vertically aligned and self-assembled from Si substrates at 500 °C by the use of Cu catalysts. Their diameters are ~50 to 80 nm with tubular wall thickness of ~10-15nm. Cu vapors were found partially filled inside the SiNTs. This is a novel technique that can convert bulk materials into their nanostructures.

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تاریخ انتشار 2008